Tantalum

Tantalum sputtering target

Material: R05200
Purity: ≥99.95%, ≥99.99%
Dimension: Customization
Standard: ASTM B708-2012
Application: Used for optical fiber, semiconductor wafer and integrated circuit of sputtering deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode sputtering coating, high vacuum suction
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Material: R05200

Purity: ≥99.95%, ≥99.99%

Dimension: Customization

Standard: ASTM B708-2012

Application: Used for optical fiber, semiconductor wafer and integrated circuit of sputtering deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode sputtering coating, high vacuum suction active material etc.

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